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Home  >  Journal list  >  Journal of the Ceramic Society of Japan  >  Vol.116  No.1355 (July) (2008)  >  pp.822-824

Journal of the Ceramic Society of Japan
<<Previous article Vol.116  No.1355 (July) (2008)   pp.822 - 824 Next article>>

Effects of process on microstructure and properties of translucent Dy-α-SiAlON sintered at lower temperatures

Junming XUE1), Qian LIU1), Ming FANG2), Lili MA3), Tongping XIU1) and Linhua GUI1)
1) State Key Laboratory of High Performance Ceramics and Superfine Microstructures, Shanghai Institute of Ceramics, Chinese Academy of Sciences
2) R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics
3) National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese academy of Sciences


  Hot pressing (HP) at higher sintering temperature has been a traditional and prevalent technique for the fabrication of α-SiAlON. In order to prepare translucent SiAlON more easily, LiF was used as a non-oxide sintering additive to lower the sintering temperature to ≤ 1650°C. As a result, all of the samples possessed a good hardness and fracture toughness. At the same time, the lower temperature sintered samples showed a higher optical transmittance in the range of 2.5-5.5 μm wavelength (0.5 mm in thickness). The maximum infrared transmission reached 68% at a wavelength of 3.3 μm. The present work shows that the sintering process has a strong effect on microstructure and property of α-SiAlON. To be exact, a lower sintering temperature and longer holding time can produce some fully-developed microstrcture, which is beneficial for the optical transmittance.


Keyword:
SiAlON, Hot-pressing, Densification, Optical transmittance

Received: February 28, 2008
Accepted: May 15, 2008 , Published online: July 01, 2008
Copyright (c) 2008 The Ceramic Society of Japan

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