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Home  >  Journal list  >  MATERIALS TRANSACTIONS  >  Vol.43  No.8 (2002)  >  pp.2092-2096

MATERIALS TRANSACTIONS
<<Previous article Vol.43  No.8 (2002)   pp.2092 - 2096 Next article>>

Electron Energy-Loss Spectroscopy of Carbon Films Prepared by Electron-Cyclotron-Resonance Plasma Sputtering

Yoshie Murooka1), Nobuo Tanaka2), Shigeru Hirono3) and Michio Hibino1)
1) Center for Integrated Research in Science and Engineering, Nagoya University
2) Department of Applied Physics, Nagoya University
3) ECR Plasma Systems Division, NTT AFTY Corporation


A protective carbon film, prepared by electron-cyclotron-resonance (ECR) plasma sputtering, has attracted considerable interest because the film can possess both the high wear durability and the high conductivity without doping. Such properties can be obtained, for example, when a negative bias voltage VB (−40≤VB≤−140 V) is applied to a substrate made of silicon. Little is known, however, about the atomic structure and bonding state of the ECR films for such a bias region, so that the physical origins of the macroscopic properties are not fully understood. In the present study, electron energy-loss spectroscopy (EELS) in a transmission electron microscope has been applied to investigate such ECR films that were deposited on a sodium chloride substrate for three different bias voltages: 0 V, −75 V and −120 V . The physical density of each ECR film was found to be lower than that of graphitized carbon and that of amorphous carbon. For each of the ECR films, the fraction of sp2 bonding was estimated to be more than 90%. The carbon clusters with sp2 bonding were considered to be more ordered for VB=−75 V and −120 V than for VB=0 V . The averaged density of valence electrons did not change much for each film, but the band structure is considered to vary depending on a local area. For the film prepared by the ECR technique, the macroscopic properties of the film such as electronic and mechanical ones may be controlled by controlling the ordering of sp2 clusters.


Keyword:
conductive hard carbon film, electron energy-loss spectroscopy, electron-cyclotron-resonance sputtering, sp2 fraction, atomic structure

Received: February 19, 2002
Accepted: June 07, 2002 , Published online: September 06, 2005
Copyright (c) 2005 The Japan Institute of Metals

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