You are not logged in Total: 7journals, 19,845articles Online
AccountAccount
Login / Register
Forgot Login?
 
Main menuMain menu
What's new
Journal list
Visiting ranking
Phrase ranking
Polls
About us
 
SearchSearch
 
Journal Site
Advanced Search
 

Home  >  Journal list  >  Journal of the Ceramic Society of Japan ( 2003 - 2007 )  >  Vol.114  No.1326 (February) (2006)  >  pp.147-154

Journal of the Ceramic Society of Japan ( 2003 - 2007 )
<<Previous article Vol.114  No.1326 (February) (2006)   pp.147 - 154 Next article>>

Reactive Solid-Phase Epitaxy: A Powerful Method for Epitaxial Film Growth of Complex Layered Oxides
(Review)

Hiromichi OHTA1)2)3)
1) Graduate School of Engineering, Nagoya University
2) CREST, Japan Science and Technology Agency (JST)
3) ERATO-SORST, Japan Science and Technology Agency (JST), in Frontier Collaborative Research Center (FCRC)


  High-quality epitaxial film growth for several complex oxides having layered structure by “Reactive Solid-Phase-Epitaxy (R-SPE1))” is reviewed. Materials focused are InGaO3(ZnO)m (m=integer), LaCuOS and NaxCoO2 (x~0.8). For the epitaxial film growths of the complex systems with a complicated layered crystal structure, it is necessary to form an epitaxial template layer before the film deposition, followed by the thermal annealing of the bilayer films. The layers subsequently deposited on the template layer may be amorphous, polycrystalline or powder, which allows control of the epitaxially grown films in the R-SPE method.



Keyword:
Reactive solid-phase epitaxy, Epitaxial film, Complex layered oxides, Natural MQW, Oxide electronics

Received: October 05, 2005
Published online: February 01, 2006
Copyright (c) 2006 The Ceramic Society of Japan

PDFPDF file (J-STAGE)J-STAGEJ-STAGE


SPARC Japan

Terms of Use | Privacy Policy