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Home  >  Journal list  >  Journal of the Ceramic Society of Japan, Supplement 112-1, PacRim5 Special Issue  >  Vol.112  23. Advances in Carbon-based Materials  >  pp.S1521-S1524

Journal of the Ceramic Society of Japan, Supplement 112-1, PacRim5 Special Issue
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Atomic Scale Friction of Amorphous Hydrogenated Carbon Thin Film in MEMS

Bum-Rae CHO1) and Jung-Yeul KIM2)
1) Department of Advanced Materials Engineering, Keimyung University
2) Department of Semiconductor Engineering, Uiduk University

  Amorphous carbon (a-C:H) films were prepared by using electron cyclotron chemical vapor deposition (ECRCVD) from gas mixtures of CH4 and H2. The effects of the deposition pressure on nanotribological behavior of the 300 nm thick DLC (diamond -like carbon) films were investigated. The properties of the films were investigated by Fourier transform infrared (FTIR), Rutherford backscattering spectrometer, Elastic recoil detection (ERD) and tribological measurement. The deposition rate of the DLC films was decreased with increasing deposition pressure due to the enhanced scattering of the film forming species in plasma at a higher deposition pressure. An increase in surface roughness was measured with increasing deposition pressure, and this can be attributed to a low ratio of H/C content on the surface. Minimum value of the friction coefficient is obtained when the deposition pressure of 2.26 Pa is employed. The DLC films with a lower hydrogen content have higher fraction of the sp3-bonded carbon atoms in an amorphous network, resulting in a higher hardness. A linear increase in friction coefficient with increasing surface roughness was observed when the applied friction load of 0.1 nN was used.

ECRCVD, DLC, Nanotribological behavior, Deposition pressure

Received: July 03, 2003
Accepted: January 20, 2004 , Published online: September 29, 2004
Copyright (c) 2004 The Ceramic Society of Japan



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