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Home  >  Journal list  >  MATERIALS TRANSACTIONS  >  Vol.45  No.7 (2004)  >  pp.1994-1997

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X-ray Fluorescence Holography Study on Si1−xGex Single Crystal

Kouichi Hayashi1), Yukio Takahashi2), Ichiro Yonenaga1) and Eiichiro Matsubara1)
1) Institute for Materials Research, Tohoku University
2) Depertment of Materials Science, Tohoku University

We measured the X-ray fluorescence holograms of Si0.999Ge0.001, Si0.8Ge0.2, Si0.5Ge0.5, Si0.2Ge0.8 and Ge single crystals, and reconstructed the images of second neighbor atoms around Ge. The positional shift of the atomic image across the whole composition range was three times larger than the value predicted from the difference in the lattice constants of pure Si and Ge. We found that imaginary part of the reconstruction strongly affects the positions of the atomic images. Thus, using the negative real parts, the atomic image became sharp and its shift dependent upon Ge composition comes to the reasonable values.

X-ray fluorescence holography, single crystal, silicon germanium, local atomic structure

Received: March 26, 2004
Accepted: May 19, 2004 , Published online: June 24, 2005
Copyright (c) 2005 The Japan Institute of Metals



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