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Home  >  Journal list  >  MATERIALS TRANSACTIONS  >  Vol.45  No.7 (2004)  >  pp.2068-2072

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Study on Fabrication of Titanium Oxide Films by Oxygen Pressure Controlled Pulsed Laser Deposition

Takahiro Nakamura1), Eiichiro Matsubara2), Nobuaki Sato3), Atsushi Muramatsu3) and Hideyuki Takahashi3)
1) Graduate School of Engineering, Department of Materials Science, Tohoku University
2) Institute for Materials Research, Tohoku University
3) Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10−6 to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO2. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.

titanium oxide, thin film, pulsed laser deposition (PLD), grazing incidence X-ray scattering (GIXS), X-ray reflection

Received: March 23, 2004
Accepted: May 21, 2004 , Published online: June 24, 2005
Copyright (c) 2005 The Japan Institute of Metals



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