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Home  >  Journal list  >  Journal of the Ceramic Society of Japan  >  Vol.123  No.1437 (May) (2015)  >  pp.329-334

Journal of the Ceramic Society of Japan
<<Previous article Vol.123  No.1437 (May) (2015)   pp.329 - 334 Next article>>

Fabrication of transparent conductive zinc oxide films by chemical bath deposition using solutions containing Zn2+ and Al3+ ions

Takahiro MORITA1), Shintaro UENO2), Eiji HOSONO3), Haoshen ZHOU3), Manabu HAGIWARA1), Shinobu FUJIHARA1)
1) Department of Applied Chemistry, Keio University 2) Graduate School Department of Interdisciplinary Research, University of Yamanashi 3) National Institute of Advanced Industrial Science and Technology

Transparent ZnO films were fabricated on glass substrates by a chemical bath deposition method using zinc acetate solutions also containing AlCl3. A predominant effect of the Al3+ addition seemed to be suppression of the growth of ZnO crystals and change of the crystallographic orientation of ZnO films. The c-axis and the a-axis of the ZnO films came to stand parallel and vertical to the substrate, respectively, by increasing the Al3+ concentration. A post ultraviolet irradiation to the films led to a decrease in the sheet resistance from the order of 106 to 104 Ω·sq.−1 without changing the morphology or the crystallinity. This might be related to the photocatalytic effect of ZnO to decompose residual organics in the films and increase the number of carriers. The ZnO film obtained from the solution with 1.0 mol % AlCl3 showed the lowest sheet resistance of 2.5 × 104 Ω·sq.−1.

ZnO, Oriented film, Chemical bath deposition, UV irradiation, Transparent conductive oxide

Received: November 29, 2014
Accepted: February 06, 2015 , Published online: May 01, 2015



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