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Home  >  Journal list  >  Polymer Journal  >  Vol.28  No.9 (1996)  >  pp.795-800

Polymer Journal
<<Previous article Vol.28  No.9 (1996)   pp.795 - 800 Next article>>

Novel Thermal Curing Reactions of Epoxy Resin and Poly(glycidyl methacrylate) Using Photo-generated Difunctional Thiols

Tadatomi Nishikubo1), Atsushi Kameyama1), Koutaro Kashiwagi1) and Naoto Oyama1)
1) Department of Applied Chemistry, Faculty of Engineering, Kanagawa University

ABSTRACT:  Blocked dithiols such as p-xylenebis(2-nitrobenzyl-α-S-thiocarbonate) (XBBTC) and bis[(2-nitrobenzyloxy-carbonyl)thioethyl]ether (EBTE) were synthesized by reactions of 1,4-bis(mercaptomethyl)benzene (BMMB) and ethylene glycol bis(mercaptoethyl)ether (EBME) with N-(2-nitrobenzyloxycarbonyl)imidazole. The prepared XBBTC and EBTE decomposed very smoothly to the corresponding dithiol such as BMMB and EBME by irradiation with UV-light in tetra-hydrofuran (THF) solution, epoxy resins, or polymer film. Thermal curing reaction of epoxy resins and poly(glycidyl methacrylate-co-methyl methacrylate) (PGMA) using photo-generated dithiols were also examined, and it was found that novolactype epoxy resin and PGMA gave gel products by heating with photo-generated dithiol compounds, although bisphenol type epoxy resin did not produce gel products by treatment under the same conditions. The ring opening reaction of the epoxide group in the mixture of epoxy compounds with blocked dithiols was confirmed by IR spectra.

Synthesis of Blocked Dithiol/ Photo-generation/ Difunctional Thiol/ Thermal Curing Reaction/ Epoxy Resin/ Poly(glycidyl methacrylate)

Published online: April 02, 2005
© Copyright, 2005 by The Society of Polymer Science, Japan



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