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Home  >  Journal list  >  MATERIALS TRANSACTIONS  >  Vol.43  No.11 (2002)  >  pp.2692-2695

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Hydrogen Enhancement of Interlayer Reaction in Ni/V Bilayer

Kazuhide Tanaka1) and Kosuke Nagai1)
1) Department of Materials Science and Engineering, Nagoya Institute of Technology

X-ray diffraction and Auger-electron spectroscopy depth profiling experiments clearly show that an interlayer reaction in a Ni/V bilayer forming Ni3V and Ni2V takes place at a temperature around 823 K when it is annealed in vacuum. However, this reaction temperature is reduced down to around 773 K when it is annealed in 0.5 MPa H2. A similar effect has also been observed for a Ni/Nb bilayer previously. These hydrogen-enhanced reactions in the two systems are interpreted to be due to formation of abundant vacancy-hydrogen complexes in the V and Nb layers, which efficiently assist the interdiffusion of the constituent atoms across the interfaces in the two bilayers.

nickel/vanadium bilayer, nickel/niobium bilayer, interlayer reaction, compound formation, hydrogenation, vacancy-hydrogen complex, enhanced interdiffusion, X-ray diffraction, Auger-electron spectroscopy depth profiling

Received: May 23, 2002
Accepted: June 27, 2002 , Published online: September 06, 2005
Copyright (c) 2005 The Japan Institute of Metals



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