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Home  >  Journal list  >  MATERIALS TRANSACTIONS  >  Vol.43  No.11 (2002)  >  pp.2932-2934

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Graded TiN Coating by Supersonic Free-Jet PVD Combined with Reactive Plasma

Atsushi Yumoto1), Takahisa Yamamoto2), Fujio Hiroki1), Ichiro Shiota3) and Naotake Niwa1)
1) Department of Mechanical Systems Engineering, Faculty of Engineering, Kogakuin University
2) Department of Advanced Materials Science, Graduate School of Frontier Sciences, University of Tokyo
3) Department of Materials Science and Technology, Faculty of Engineering, Kogakuin University

Ceramic coating is a very popular technology for improving the properties of structural materials. A titanium nitride (TiN) coating is a typical example and has been widely applied to cutting tools, electronic devices and many other fields utilizing its superior physical properties. This paper sought to produce a graded TiN coating on a Ti substrate by combining Supersonic Free-Jet PVD (SFJ-PVD) with a reactive plasma-metal reaction technique. The authors have developed SFJ-PVD as a new coating method in which a coating film is formed by depositing nanoparticles with very high velocity onto a substrate. SFJ-PVD can provide a high deposition rate and thick film coating. Gradually changing the nitrogen flow rate during deposition produces a graded TiN coating, in which composition changes gradually from pure Ti to TiN . A monolithic TiN coating is also produced with SFJ-PVD . XRD analysis of the graded TiN detected peaks for Ti, Ti2N and TiN, while only a TiN peak is observed in the monolithic TiN coating. EPMA analysis of a graded coating reveals a gradual compositional change from pure Ti to TiN . Few pores or cracks are observed in a graded TiN or in a monolithic TiN formed under the optimized conditions of SFJ-PVD.

physical vapor deposition, supersonic gas flow, nanoparticle, functionally graded material, titanium nitride

Received: July 29, 2002
Accepted: September 30, 2002 , Published online: September 06, 2005
Copyright (c) 2005 The Japan Institute of Metals



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